EUV LIGHT SOURCE TARGET METROLOGY

Disclosed is an apparatus for and method of aligning a target composed of a target material and a conditioning beam provided to condition the target by changing the target's shape, mass distribution, etc., in which the conditioning beam includes structured light in the form of an inhomogeneous...

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Bibliographic Details
Main Author Rafac, Robert Jay
Format Patent
LanguageEnglish
Published 21.09.2023
Subjects
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
X-RAY TECHNIQUE
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Summary:Disclosed is an apparatus for and method of aligning a target composed of a target material and a conditioning beam provided to condition the target by changing the target's shape, mass distribution, etc., in which the conditioning beam includes structured light in the form of an inhomogeneous distribution of a propagation mode such as a polarization mode across a spatial mode of the target.
Bibliography:Application Number: US202118016553