METHOD AND APPARATUS FOR MICROMACHINING A SAMPLE USING A FOCUSED ION BEAM

An apparatus and a method for micromachining samples is provided. The apparatus includes an integral combination of a sample holder, a focused ion beam exposure system for projecting a FIB onto a first position on the sample, and a light optical microscope. The LM is configured for imaging or monito...

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Bibliographic Details
Main Authors DEN HOEDT, Sander Vincent, EFFTING, Andries Pieter Johan
Format Patent
LanguageEnglish
Published 21.09.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Summary:An apparatus and a method for micromachining samples is provided. The apparatus includes an integral combination of a sample holder, a focused ion beam exposure system for projecting a FIB onto a first position on the sample, and a light optical microscope. The LM is configured for imaging or monitoring said first position. The method includes the steps of capturing LM images of the sample, determining a position and physical dimensions of a region of interest in the sample based on the LM images, establishing from the LM images settings of the sample holder and/or the FIB exposure system, for micromachining the sample to bring the region of interest more closer to the surface, and moving the sample or the trajectory of the FIB to locate the first position on the sample accordingly, and activating the FIB for micromachining the sample.
Bibliography:Application Number: US202118016057