METHOD FOR ADJUSTING A PATTERNING PROCESS

• Main Authors: BOND, Stephen Henry, DICKER, Gerald, KHEDEKAR, Satej Subhash, GANTAPARA, Anjan Prasad, GUO, Chaoqun, BOLDER, Joost Johan, HLOD, Andriy Vasyliovich, AARDEN, Frans Bernard, CASTELIJNS, Henricus Jozef, ZHANG, Youping, HUBAUX, Arnaud, VAN BERKEL, Koos, GONZALEZ HUESCA, Juan Manuel, STEINMEIER, Ewout Klaas, LIN, Chenxi, MOSSAVAT, Seyed Iman, ZOU, Yi, CHEN, Hongwei, YPMA, Alexander, LI, Zhaoze
• Format: Patent
• Language: English
• Published: 31.08.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

Generating a control output for a patterning process is described. A control input is received. The control input is for controlling the patterning process. The control input includes one or more parameters used in the patterning process. The control output is generated with a trained machine learning mod& based on the control input, The machine learning model is trained with training data generated from simulation of the patterning process and/or actual process data, The training data includes 1) a plurality of training control inputs corresponding to a plurality of operational conditions of the patterning process, where the plurality of operational conditions of the patterning process are associated with operational condition specific behavior of the patterning process over time, and 2) training control outputs generated using a physical model based on the training control inputs.