SOLID-STATE IMAGING DEVICE AND MANUFACTURING METHOD THEREFOR
The present feature relates to a solid-state imaging device that allows generation of flare to be reduced and a manufacturing method therefor. A solid-state imaging device according to the present feature includes a semiconductor substrate having a pixel area having a plurality of pixels provided th...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
17.08.2023
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Subjects | |
Online Access | Get full text |
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Summary: | The present feature relates to a solid-state imaging device that allows generation of flare to be reduced and a manufacturing method therefor. A solid-state imaging device according to the present feature includes a semiconductor substrate having a pixel area having a plurality of pixels provided therein, and a transparent structure joined to a light incident surface side of the semiconductor substrate with resin and having a hollow structure. In the solid-state imaging device according to the present feature, the transparent structure includes a glass substrate and a transparent film, and the hollow structure is formed between the glass substrate and the transparent film. The present feature can be applied for example to imaging devices. |
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Bibliography: | Application Number: US202118003960 |