Composite Hard Masks For Ultra-Thin Magnetic Sensors

A composite hard mask is disclosed. In some embodiments, a first sacrificial hard mask layer comprising an amorphous carbon or silicon nitride and a second sacrificial hard mask layer comprising a silicon nitride, silicon oxide, metal, metal oxide, or metal nitride, wherein the first and second sacr...

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Bibliographic Details
Main Authors Yu, Minghui, Cai, Yunqing, Ding, Ruhang, Li, Min, Zhou, Richard, Omine, Hiroshi, Zhong, Tom, Qin, QingJun, Chye, Yewhee
Format Patent
LanguageEnglish
Published 17.08.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
DRESSING OR CONDITIONING OF ABRADING SURFACES
ELECTRICITY
ELECTROGRAPHY
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
HOLOGRAPHY
INDUCTANCES
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
MAGNETS
MATERIALS THEREFOR
MEASURING
MEASURING ELECTRIC VARIABLES
MEASURING MAGNETIC VARIABLES
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
POLISHING
SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
TESTING
TRANSFORMERS
TRANSPORTING
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Summary:A composite hard mask is disclosed. In some embodiments, a first sacrificial hard mask layer comprising an amorphous carbon or silicon nitride and a second sacrificial hard mask layer comprising a silicon nitride, silicon oxide, metal, metal oxide, or metal nitride, wherein the first and second sacrificial hard mask layers are not made of the same material.
Bibliography:Application Number: US202217671413