UNIFORMITY CONTROL CIRCUIT FOR IMPEDANCE MATCH
An impedance match housing is described. The impedance match housing includes an impedance matching circuit having an input that is coupled to a radio frequency (RF) generator. The impedance matching circuit has an output that is coupled to a first RF strap. The impedance match housing includes a un...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
10.08.2023
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Subjects | |
Online Access | Get full text |
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Summary: | An impedance match housing is described. The impedance match housing includes an impedance matching circuit having an input that is coupled to a radio frequency (RF) generator. The impedance matching circuit has an output that is coupled to a first RF strap. The impedance match housing includes a uniformity control circuit coupled in parallel to a portion of the first RF strap to modify uniformity in a processing rate of a substrate when the substrate is processed within a plasma chamber. |
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Bibliography: | Application Number: US202118010194 |