UNIFORMITY CONTROL CIRCUIT FOR IMPEDANCE MATCH

An impedance match housing is described. The impedance match housing includes an impedance matching circuit having an input that is coupled to a radio frequency (RF) generator. The impedance matching circuit has an output that is coupled to a first RF strap. The impedance match housing includes a un...

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Bibliographic Details
Main Authors Holland, John P, Marakhtanov, Alexei M, Kozakevich, Felix Leib, Ji, Bing
Format Patent
LanguageEnglish
Published 10.08.2023
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Summary:An impedance match housing is described. The impedance match housing includes an impedance matching circuit having an input that is coupled to a radio frequency (RF) generator. The impedance matching circuit has an output that is coupled to a first RF strap. The impedance match housing includes a uniformity control circuit coupled in parallel to a portion of the first RF strap to modify uniformity in a processing rate of a substrate when the substrate is processed within a plasma chamber.
Bibliography:Application Number: US202118010194