ADAPTIVE OPTICAL ELEMENT FOR MICROLITHOGRAPHY
An adaptive optical element for microlithography comprises at least one manipulator for changing the shape of an optical surface of the optical element. The manipulator comprises a dielectric medium which is deformable via an electric field, work electrodes for generating the electric field in the d...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
20.07.2023
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Subjects | |
Online Access | Get full text |
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Summary: | An adaptive optical element for microlithography comprises at least one manipulator for changing the shape of an optical surface of the optical element. The manipulator comprises a dielectric medium which is deformable via an electric field, work electrodes for generating the electric field in the dielectric medium, and a measuring electrode for measuring temperature. The measuring electrode is arranged in a direct assemblage with the dielectric medium. The measuring electrode has a temperature-dependent resistance. |
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Bibliography: | Application Number: US202318188814 |