LOW VIA RESISTANCE INTERCONNECT STRUCTURE

An interconnect structure comprising a low via resistance via structure is disclosed. The via structure comprises a barrier layer on sidewalls and at bottom of the via structure. The interconnect structure also includes a first metal layer. The interconnect structure further includes a second metal...

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Bibliographic Details
Main Authors Zhu, John Jianhong, Nallapati, Giridhar, BAO, Junjing
Format Patent
LanguageEnglish
Published 13.07.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:An interconnect structure comprising a low via resistance via structure is disclosed. The via structure comprises a barrier layer on sidewalls and at bottom of the via structure. The interconnect structure also includes a first metal layer. The interconnect structure further includes a second metal layer between the barrier layer at the bottom of the via structure and the first metal layer, wherein the first metal layer and the second metal layer comprise different materials.
Bibliography:Application Number: US202217573461