HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS

A hardmask composition, a hardmask layer manufactured from the hardmask composition, and a method of forming patterns from the hardmask composition, the composition including a solvent; and a polymer including a structural unit represented by Chemical Formula 1,

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Bibliographic Details
Main Authors SHIN, Seung-Wook, KIM, Sangmi, CHOI, Seil, CHOE, Huiseon, PARK, Sangchol, KIM, Seunghyun, PARK, Yushin
Format Patent
LanguageEnglish
Published 13.07.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A hardmask composition, a hardmask layer manufactured from the hardmask composition, and a method of forming patterns from the hardmask composition, the composition including a solvent; and a polymer including a structural unit represented by Chemical Formula 1,
Bibliography:Application Number: US202217969931