DUTY CYCLE CONTROL TO ACHIEVE UNIFORMITY

A method for achieving a first uniformity level in a processing rate across a surface of a substrate is described. The method includes receiving the first uniformity level to be achieved across the surface of the substrate and identifying a first plurality of duty cycles associated with a first plur...

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Bibliographic Details
Main Authors Bhowmick, Ranadeep, Holland, John P, Marakhtanov, Alexei M, Kozakevich, Felix Leib, Ji, Bing
Format Patent
LanguageEnglish
Published 06.07.2023
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Summary:A method for achieving a first uniformity level in a processing rate across a surface of a substrate is described. The method includes receiving the first uniformity level to be achieved across the surface of the substrate and identifying a first plurality of duty cycles associated with a first plurality of states based on the first uniformity level. The first plurality of states are of a variable of a first radio frequency (RF) signal. The method further includes controlling an RF generator to generate the first RF signal having the first plurality of duty cycles.
Bibliography:Application Number: US202118011131