SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

The inventive concept provides a substrate processing apparatus. The substrate processing apparatus may include a chamber having an interior space, a support unit that supports a substrate in the interior space, a ring unit disposed on an edge region of the support unit when viewed from above, an im...

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Bibliographic Details
Main Authors Jo, Tae Hoon, AN, Chan Yong, Yoo, Sang Moon, Gu, Ja Myung
Format Patent
LanguageEnglish
Published 06.07.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:The inventive concept provides a substrate processing apparatus. The substrate processing apparatus may include a chamber having an interior space, a support unit that supports a substrate in the interior space, a ring unit disposed on an edge region of the support unit when viewed from above, an impedance control unit electrically connected to the ring unit to control a flow or density of plasma in an edge region of the substrate and a filter unit disposed between the ring unit and the impedance control unit.
Bibliography:Application Number: US202218147480