THERMAL DRIFT CORRECTION BASED ON THERMAL MODELING

The present invention relates to a method to reduce drift of a sample and/or its image in a microscopy system, wherein the method comprises determining an expected thermal drift of the sample, and compensating for the drift of the sample and/or its image based upon the expected thermal drift. The pr...

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Bibliographic Details
Main Authors VAN DEN OETELAAR, Johannes, VAN WENSVEEN, Marcel, VERHEIJEN, Martin, VAN LEEUWEN, Hugo, VERSCHUEREN, Edwin, LAMERS, Ronald
Format Patent
LanguageEnglish
Published 15.06.2023
Subjects
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Summary:The present invention relates to a method to reduce drift of a sample and/or its image in a microscopy system, wherein the method comprises determining an expected thermal drift of the sample, and compensating for the drift of the sample and/or its image based upon the expected thermal drift. The present invention also relates to a corresponding microscopy system and a computer program product to perform the method according to the present invention.
Bibliography:Application Number: US202218081689