SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

A semiconductor device may include: a memory cell disposed over a substrate and including a variable resistance layer and a selector layer; a protection layer disposed on side surfaces of the memory cell and an upper surface of the substrate on which the memory cell is not disposed; and a first enca...

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Bibliographic Details
Main Authors DONG, Cha Deok, KIM, Guk Cheon, CHOI, Keo Rock
Format Patent
LanguageEnglish
Published 01.06.2023
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Summary:A semiconductor device may include: a memory cell disposed over a substrate and including a variable resistance layer and a selector layer; a protection layer disposed on side surfaces of the memory cell and an upper surface of the substrate on which the memory cell is not disposed; and a first encapsulation layer disposed on the memory cell and the protection layer, wherein the protection layer may include a treated surface that is modified by a material including helium.
Bibliography:Application Number: US202217903907