MOLYBDENUM PRECURSOR COMPOUNDS
The invention provides certain molybdenum-containing compounds which are believed to be useful in the vapor deposition of molybdenum-containing films onto the surface of various microelectronic device substrates. In one aspect, the invention provides a process for depositing a molybdenum-containing...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
11.05.2023
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Subjects | |
Online Access | Get full text |
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Summary: | The invention provides certain molybdenum-containing compounds which are believed to be useful in the vapor deposition of molybdenum-containing films onto the surface of various microelectronic device substrates. In one aspect, the invention provides a process for depositing a molybdenum-containing film onto a microelectronic device substrate, which comprises exposing the substrate, in a reaction zone, to a compound of Formula (I) as described herein, under vapor deposition conditions. |
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Bibliography: | Application Number: US202217982220 |