SUBSTRATE SUPPORT, LITHOGRAPHIC APPARATUS AND LOADING METHOD
A substrate support for supporting a substrate. The substrate support includes a main body, a clamping device and a dither device. The main body includes a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the suppor...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
04.05.2023
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Subjects | |
Online Access | Get full text |
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Summary: | A substrate support for supporting a substrate. The substrate support includes a main body, a clamping device and a dither device. The main body includes a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate is being loaded onto the support surface. |
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Bibliography: | Application Number: US202218090873 |