FLOW RATE CONTROL DEVICE AND FLOW RATE CONTROL METHOD

• Main Authors: SUGITA, Katsuyuki, HIRATA, Kaoru, IDEGUCHI, Keisuke, NISHINO, Kouji, OGAWA, Shinya
• Format: Patent
• Language: English
• Published: 27.04.2023
• Subjects: CONTROL OR REGULATING SYSTEMS IN GENERAL; CONTROLLING; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS; PHYSICS; REGULATING; SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES

A flow rate control device (8) includes a control valve (6) having a valve element and a piezoelectric element for moving the valve element, and an arithmetic processing circuit (7) for controlling an operation of the control valve, wherein the arithmetic processing circuit is configured to receive an external command signal SE corresponding to a target flow rate when opening the control valve from a closed state so that a gas flows at the target flow rate, and to generate an internal command signal E1 output to a driving circuit for determining a voltage applied to the piezoelectric element based on the external command signal, the internal command signal is a signal that rises with time from zero and converges to a value of the external command signal, and is generated such that a slope at the time of initial rise and a slope immediately before convergence are smaller than a slope therebetween.