SOLID-STATE IMAGING DEVICE

A solid-state imaging device that includes a first substrate, one or multiple second substrates, a first wiring layer, a second wiring layer, and a first alignment part. The first substrate includes a first semiconductor substrate with multiple photoelectric conversion sections, and a multilayer wir...

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Bibliographic Details
Main Authors KANEGUCHI, Tokihisa, SHIMIZU, Kan
Format Patent
LanguageEnglish
Published 06.04.2023
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Summary:A solid-state imaging device that includes a first substrate, one or multiple second substrates, a first wiring layer, a second wiring layer, and a first alignment part. The first substrate includes a first semiconductor substrate with multiple photoelectric conversion sections, and a multilayer wiring layer. The one or multiple second substrates are attached to the first substrate with the multilayer wiring layer interposed therebetween. The first wiring layer is in the multilayer wiring layer and includes multiple first thin metal wires formed at substantially the same first pitches. The second wiring layer is stacked above the first wiring layer in the multilayer wiring layer and includes multiple second thin metal wires formed between the multiple first thin metal wires at substantially the same second pitches in a plan view. The first alignment part is formed above the second wiring layer in the multilayer wiring layer.
Bibliography:Application Number: US202117909822