SULFATE FREE CLEAR PERSONAL CLEANSING COMPOSITION COMPRISING LOW INORGANIC SALT

A clear personal cleansing composition having an anionic surfactant, a cationic deposition polymer, an aqueous carrier and a level of inorganic salt of from about 0 to about 1 wt %. The composition is substantially free of sulfates and has a % T of greater than about 80%. The composition can further...

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Bibliographic Details
Main Authors Bureiko, Andrei Sergeevich, Hutton, III, Howard David, Koenig, Peter Herbert, Song, Brian Xiaoqing, Cochran, Brooke Michele
Format Patent
LanguageEnglish
Published 23.03.2023
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Summary:A clear personal cleansing composition having an anionic surfactant, a cationic deposition polymer, an aqueous carrier and a level of inorganic salt of from about 0 to about 1 wt %. The composition is substantially free of sulfates and has a % T of greater than about 80%. The composition can further comprise amphoteric surfactants. The composition remains phase stable and minimizes coacervate formulation until after dilution with water.
Bibliography:Application Number: US202217986044