WAFER PROCESSING APPARATUS INCLUDING EFEM AND METHOD OF PROCESSING WAFER

A wafer processing apparatus may include a plurality of equipment front end modules (EFEMs), a wafer transfer chamber, a wafer processing chamber, and a wafer transfer arm. Each of the plurality of EFEMs may include an EFEM chamber, a plurality of load ports provided at a side of the EFEM chamber, a...

Full description

Saved in:
Bibliographic Details
Main Authors Choi, Jinhyuk, Hwang, Beomsoo, Lee, Kongwoo, Lee, Kyusang, Seo, Jonghwi, Kim, Keonwoo, Song, Myungki
Format Patent
LanguageEnglish
Published 16.03.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:A wafer processing apparatus may include a plurality of equipment front end modules (EFEMs), a wafer transfer chamber, a wafer processing chamber, and a wafer transfer arm. Each of the plurality of EFEMs may include an EFEM chamber, a plurality of load ports provided at a side of the EFEM chamber, and a load lock provided at a side of the EFEM chamber to overlap with at least one of the plurality of load ports in a vertical direction.
Bibliography:Application Number: US202217722838