LAYER STRUCTURES INCLUDING CARBON-BASED MATERIAL, METHODS OF MANUFACTURING THE LAYER STRUCTURES, ELECTRONIC DEVICES INCLUDING THE LAYER STRUCTURES, AND ELECTRONIC APPARATUSES INCLUDING THE ELECTRONIC DEVICES
Provided are a layer structure including a carbon-based material, a method of manufacturing the layer structure, an electronic device including the layer structure, and an electronic apparatus including the electronic device. The layer structure may include a lower layer, an ion implantation layer i...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
16.03.2023
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Subjects | |
Online Access | Get full text |
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Summary: | Provided are a layer structure including a carbon-based material, a method of manufacturing the layer structure, an electronic device including the layer structure, and an electronic apparatus including the electronic device. The layer structure may include a lower layer, an ion implantation layer in the lower layer, and a carbon-based material layer on the ion implantation layer, wherein the ion implantation layer includes carbon. The ion implantation layer may include a trench, and the carbon-based material layer may be provided in the trench. The carbon-based material layer may be formed to coat an inner surface of the trench. The carbon-based material layer may fill at least a portion of the trench. The ion implantation concentration of the ion implantation layer may be uniform as a whole. The ion implantation layer may have an ion implantation concentration gradient in a given direction. |
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Bibliography: | Application Number: US202217945534 |