CMP COMPOSITION INCLUDING AN ANIONIC ABRASIVE
A chemical mechanical polishing composition comprises, consists of, or consists essentially of a liquid carrier, anionic particles dispersed in the liquid carrier, an anionic polymer or surfactant, and a cationic polymer.
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| Main Authors | , , , , |
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| Format | Patent |
| Language | English |
| Published |
09.03.2023
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| Subjects | |
| Online Access | Get full text |
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| Abstract | A chemical mechanical polishing composition comprises, consists of, or consists essentially of a liquid carrier, anionic particles dispersed in the liquid carrier, an anionic polymer or surfactant, and a cationic polymer. |
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| AbstractList | A chemical mechanical polishing composition comprises, consists of, or consists essentially of a liquid carrier, anionic particles dispersed in the liquid carrier, an anionic polymer or surfactant, and a cationic polymer. |
| Author | Dockery, Kevin P Wu, Hsin-Yen Lee, Yang-Yao Shie, Chi-Rung Zhang, Na |
| Author_xml | – fullname: Shie, Chi-Rung – fullname: Zhang, Na – fullname: Wu, Hsin-Yen – fullname: Lee, Yang-Yao – fullname: Dockery, Kevin P |
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| Notes | Application Number: US202217895967 |
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| PublicationDateYYYYMMDD | 2023-03-09 |
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| PublicationYear | 2023 |
| RelatedCompanies | CMC Materials, Inc |
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| Snippet | A chemical mechanical polishing composition comprises, consists of, or consists essentially of a liquid carrier, anionic particles dispersed in the liquid... |
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| SubjectTerms | ADHESIVES CHEMISTRY DYES METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES |
| Title | CMP COMPOSITION INCLUDING AN ANIONIC ABRASIVE |
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