CMP COMPOSITION INCLUDING AN ANIONIC ABRASIVE

A chemical mechanical polishing composition comprises, consists of, or consists essentially of a liquid carrier, anionic particles dispersed in the liquid carrier, an anionic polymer or surfactant, and a cationic polymer.

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Bibliographic Details
Main Authors Shie, Chi-Rung, Zhang, Na, Wu, Hsin-Yen, Lee, Yang-Yao, Dockery, Kevin P
Format Patent
LanguageEnglish
Published 09.03.2023
Subjects
ADHESIVES
CHEMISTRY
DYES
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
POLISHES
POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH
SKI WAXES
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Summary:A chemical mechanical polishing composition comprises, consists of, or consists essentially of a liquid carrier, anionic particles dispersed in the liquid carrier, an anionic polymer or surfactant, and a cationic polymer.
Bibliography:Application Number: US202217895967