DEPOSITION COMPOSITIONS AND METHODS OF MAKING AND USING SAME

A deposition composition includes a solvent comprising a hydrofluorothioether compound represented by the following general formula (I): Rf-S-Rh where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and...

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Bibliographic Details
Main Authors Kehren, Jason M, Monteil, Alexandre R, Costello, Michael G, Lundberg, David J, Bulinski, Michael J, Qiu, Zai-Ming
Format Patent
LanguageEnglish
Published 23.02.2023
Subjects
CHEMISTRY
FUELS
LUBRICANTS
LUBRICATING COMPOSITIONS
METALLURGY
PEAT
PETROLEUM, GAS OR COKE INDUSTRIES
TECHNICAL GASES CONTAINING CARBON MONOXIDE
USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATINGINGREDIENTS IN A LUBRICATING COMPOSITION
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Summary:A deposition composition includes a solvent comprising a hydrofluorothioether compound represented by the following general formula (I): Rf-S-Rh where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and Rh is a non-fluorinated hydrocarbon group having 1-3 carbon atoms. The deposition composition further includes a coating material that is soluble or dispersible in said solvent.
Bibliography:Application Number: US202117795387