ELECTRON BEAM RADIATION SYSTEM WITH ADVANCED APPLICATOR COUPLING SYSTEM HAVING INTEGRATED DISTANCE DETECTION AND TARGET ILLUMINATION

The present invention relates to linear, straight through electron beam machines that incorporate a rotary coupling system to easily attach and manually or automatically rotate field defining members such as applicators and/or shields to the electron beam machines. The rotary coupling systems also i...

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Bibliographic Details
Main Authors Turk, Michael F, Patane, Christopher J, Johnson, Richard L
Format Patent
LanguageEnglish
Published 09.02.2023
Subjects
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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Summary:The present invention relates to linear, straight through electron beam machines that incorporate a rotary coupling system to easily attach and manually or automatically rotate field defining members such as applicators and/or shields to the electron beam machines. The rotary coupling systems also incorporate functionality for using different kinds of optical signals to automatically provide illumination, reference mark projection, and/or distance detection. The optical signals generated downstream from heavy collimator components and are transmitted along the central axis of the field defining elements so that function and accuracy are maintained as the components rotate.
Bibliography:Application Number: US202017779796