PLASMA PROCESSING APPARATUS INCLUDING GAS DISTRIBUTION PLATE

A plasma processing apparatus may include a support configured to receive a substrate, a gas distribution plate (GDP) including a plurality of nozzles facing the support, a main splitter configured to supply a process gas, and an additional splitter configured to supply an acceleration gas or a dece...

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Bibliographic Details
Main Authors Park, Jin Young, Jeon, Sang Jean, Park, Ho Yong, Han, Je Woo, Sun, Jong Woo, Um, Jung Hwan, Park, Chan Hoon, Bang, Jin Young
Format Patent
LanguageEnglish
Published 02.02.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A plasma processing apparatus may include a support configured to receive a substrate, a gas distribution plate (GDP) including a plurality of nozzles facing the support, a main splitter configured to supply a process gas, and an additional splitter configured to supply an acceleration gas or a deceleration gas. The plurality of nozzles may include a plurality of central nozzles, a plurality of outer nozzles, a plurality of middle nozzles configured to spray the process gas and the acceleration gas, a plurality of first nozzles, and a plurality of second nozzles.
Bibliography:Application Number: US202217951910