PROCESS FLUID PATH SWITCHING IN RECIPE OPERATIONS

• Main Authors: Kril, Thorsten, Jamakhandi, Vishal Suresh, Standish, Peter, Neema, Chahal, Sanghvi, Mitesh, Kangude, Abhijit Ashok, Shankaramurthy, Venkatanarayana, Baryshnikov, Anton
• Format: Patent
• Language: English
• Published: 26.01.2023
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; CONTROL OR REGULATING SYSTEMS IN GENERAL; CONTROLLING; DIFFUSION TREATMENT OF METALLIC MATERIAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS; PHYSICS; REGULATING; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES

A method includes identifying time values for a length of time to carry out process fluid delivery within multiple processing chambers that concurrently process multiple substrates; translating each time value to a recipe parameter for execution of an operation of a processing recipe; and causing the operation to be performed using each recipe parameter as a control value to control valves of a fluid panel of the multiple processing chambers. For each processing chamber of the multiple processing chambers, selectively controlling process fluid flow to the process chamber for a first period of time corresponding to a time value of the set of time values and to a divert foreline of the process chamber for a second period of time.