SEMICONDUCTOR DEVICE
A semiconductor device with reduced power consumption can be provided. The semiconductor device includes a first transistor and a second transistor. The first transistor is a p-channel transistor including silicon in a channel formation region and the second transistor is an n-channel transistor inc...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
19.01.2023
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Subjects | |
Online Access | Get full text |
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Summary: | A semiconductor device with reduced power consumption can be provided. The semiconductor device includes a first transistor and a second transistor. The first transistor is a p-channel transistor including silicon in a channel formation region and the second transistor is an n-channel transistor including a metal oxide in a channel formation region. The metal oxide includes indium, an element M (e.g., gallium), and zinc. A gate of the first transistor is electrically connected to a gate of the second transistor, and one of a source and a drain of the first transistor is electrically connected to one of a source and a drain of the second transistor. The first transistor and the second transistor can each operate in a subthreshold region. |
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Bibliography: | Application Number: US202217847241 |