SYSTEMS AND METHODS FOR FILM DEPOSITION
A system is described herein for film deposition includes a drum; a motor configured to rotate the drum in a direction of rotation; a target including a target material; and a holder attached to the drum. The holder is configured to accommodate a substrate and to expose the substrate to free particl...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
05.01.2023
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Subjects | |
Online Access | Get full text |
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Summary: | A system is described herein for film deposition includes a drum; a motor configured to rotate the drum in a direction of rotation; a target including a target material; and a holder attached to the drum. The holder is configured to accommodate a substrate and to expose the substrate to free particles of the target material sputtered from the target, and the holder has an asymmetric shape. |
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Bibliography: | Application Number: US202017779231 |