METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR DEVICE

In a method of manufacturing a semiconductor device, a fin structure having a channel region protruding from an isolation insulating layer disposed over a semiconductor substrate is formed, a cleaning operation is performed, and an epitaxial semiconductor layer is formed over the channel region. The...

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Main Authors CHEN, Hung-Yao, PAN, Zheng-Yang, TAN, Lun-Kuang, CHAU, Cheng-Po, CHIU, Ya-Wen, LI, Yi-Cheng, LIANG, Pin-Ju, YU, De-Wei, CHAN, Yi Che
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LanguageEnglish
Published 24.11.2022
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Abstract In a method of manufacturing a semiconductor device, a fin structure having a channel region protruding from an isolation insulating layer disposed over a semiconductor substrate is formed, a cleaning operation is performed, and an epitaxial semiconductor layer is formed over the channel region. The cleaning operation and the forming the epitaxial semiconductor layer are performed in a same chamber without breaking vacuum.
AbstractList In a method of manufacturing a semiconductor device, a fin structure having a channel region protruding from an isolation insulating layer disposed over a semiconductor substrate is formed, a cleaning operation is performed, and an epitaxial semiconductor layer is formed over the channel region. The cleaning operation and the forming the epitaxial semiconductor layer are performed in a same chamber without breaking vacuum.
Author CHIU, Ya-Wen
TAN, Lun-Kuang
CHEN, Hung-Yao
YU, De-Wei
CHAN, Yi Che
LIANG, Pin-Ju
PAN, Zheng-Yang
CHAU, Cheng-Po
LI, Yi-Cheng
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– fullname: LI, Yi-Cheng
– fullname: LIANG, Pin-Ju
– fullname: YU, De-Wei
– fullname: CHAN, Yi Che
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RelatedCompanies TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD
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Snippet In a method of manufacturing a semiconductor device, a fin structure having a channel region protruding from an isolation insulating layer disposed over a...
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SubjectTerms BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Title METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR DEVICE
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