TRANSISTOR STRUCTURE AND MANUFACTURING METHOD OF THE SAME

Present disclosure provides a transistor structure, including a substrate, a first gate extending along a longitudinal direction over the substrate, the first gate including a gate electrode, a second gate over the substrate and apart from the first gate, a source region of a first conductivity type...

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Bibliographic Details
Main Authors LIN, TUNG-YANG, CHOU, HSUEH-LIANG
Format Patent
LanguageEnglish
Published 10.11.2022
Subjects
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