TRANSISTOR STRUCTURE AND MANUFACTURING METHOD OF THE SAME
Present disclosure provides a transistor structure, including a substrate, a first gate extending along a longitudinal direction over the substrate, the first gate including a gate electrode, a second gate over the substrate and apart from the first gate, a source region of a first conductivity type...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
10.11.2022
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Subjects | |
Online Access | Get full text |
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