SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
Some implementations described herein provide an exposure tool and associated methods of operation in which a scanner control system generates a scanner route for an exposure recipe such that the distance traveled by a substrate stage of the exposure tool along the scanner route is reduced and/or op...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
03.11.2022
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Subjects | |
Online Access | Get full text |
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Summary: | Some implementations described herein provide an exposure tool and associated methods of operation in which a scanner control system generates a scanner route for an exposure recipe such that the distance traveled by a substrate stage of the exposure tool along the scanner route is reduced and/or optimized for non-exposure fields on a semiconductor substrate. In this way, the scanner control system increases the productivity of the exposure tool, reduces processing times of the exposure tool, and increases yield in a semiconductor fabrication facility in which the exposure tool is included. |
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Bibliography: | Application Number: US202117446252 |