Mask Defect Prevention
A photolithographic mask assembly according to the present disclosure accompanies a photolithographic mask. The photolithographic mask includes a capping layer over a substrate and an absorber layer disposed over the capping layer. The absorber layer includes a first main feature area, a second main...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English |
Published |
03.11.2022
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Subjects | |
Online Access | Get full text |
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Summary: | A photolithographic mask assembly according to the present disclosure accompanies a photolithographic mask. The photolithographic mask includes a capping layer over a substrate and an absorber layer disposed over the capping layer. The absorber layer includes a first main feature area, a second main feature area, and a venting feature area disposed between the first main feature area and the second main feature area. The venting feature area includes a plurality of venting features. |
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Bibliography: | Application Number: US202217809979 |