POLYAMIC ACID, POLYIMIDE, AND ELEMENT FORMED THEREFROM

A polyimide is provided, which contains at least one repeating unit selected from a group consisting of the following general formulas, M, N, and O:X is a residue derived from TCA represented by formula I. Y1 is a residue derived from a diamine with a cardo structure. Y2 is a residue derived from a...

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Bibliographic Details
Main Authors LEE, Shih-Wei, SHIH, Tzu-Yuan, HUANG, Shih-Hung, FU, Chuan-Jen, LIN, Hsiao-Chu, YANG, Shu-Mei
Format Patent
LanguageEnglish
Published 03.11.2022
Subjects
CHEMISTRY
COMPOSITIONS BASED THEREON
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:A polyimide is provided, which contains at least one repeating unit selected from a group consisting of the following general formulas, M, N, and O:X is a residue derived from TCA represented by formula I. Y1 is a residue derived from a diamine with a cardo structure. Y2 is a residue derived from a diamine with the structure of a benzene ring, biphenyl, phenylbenzimidazole or phenylbenzoxazole. Y3 is a residue derived from a diamine with an ether or an ester group.
Bibliography:Application Number: US202117393031