SILICA SUBSTRATES FOR SLOW RELEASE ASPHALTENE CONTROL CHEMICAL SQUEEZE TREATMENTS

The present disclosure provides methods and compositions for controlling asphaltenes in a subterranean formation. The compositions may include silica, a polymer, and optionally a charged surfactant. The compositions may also include a solvent or other additives. The methods may include injecting the...

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Bibliographic Details
Main Authors Bartels, Jeremy Wayne, Lucente-Schultz, Rebecca Michele, Bhandari, Manojkumar Ramnikalal, Russell, Christopher Alexander, Nguyen, Duy T
Format Patent
LanguageEnglish
Published 27.10.2022
Subjects
ADHESIVES
CHEMISTRY
DYES
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
POLISHES
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Summary:The present disclosure provides methods and compositions for controlling asphaltenes in a subterranean formation. The compositions may include silica, a polymer, and optionally a charged surfactant. The compositions may also include a solvent or other additives. The methods may include injecting the compositions into subterranean formations and inhibiting asphaltene precipitation.
Bibliography:Application Number: US202117557611