DEFECT INSPECTION APPARATUS, METHOD FOR INSPECTING DEFECT, AND METHOD FOR MANUFACTURING PHOTOMASK BLANK

A defect inspection apparatus has a defect detection unit 152 that acquires first defect information on a defect of a photomask blank MB as a substrate; and a comparative information acquisition unit 150 that acquires a result of comparison between predetermined defect information stored in a storag...

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Bibliographic Details
Main Authors TERASHIMA, Ryusei, Terasawa, Tsuneo, Yoshino, Takumi
Format Patent
LanguageEnglish
Published 06.10.2022
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
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Summary:A defect inspection apparatus has a defect detection unit 152 that acquires first defect information on a defect of a photomask blank MB as a substrate; and a comparative information acquisition unit 150 that acquires a result of comparison between predetermined defect information stored in a storage unit 155 and the first defect information.
Bibliography:Application Number: US202217712031