ENHANCED OXIDATION WITH HYDROGEN RADICAL PRETREATMENT

Enhanced oxidation with hydrogen radical pretreatment is described. In an example, a method of oxidizing a substrate includes positioning a substrate in a processing volume of a processing chamber, generating hydrogen radicals using a remote plasma source fluidly coupled to the processing chamber, e...

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Bibliographic Details
Main Authors Tam, Norman, Sharma, Shashank, Spuller, Matthew, Kumar, Pradeep Sampath
Format Patent
LanguageEnglish
Published 22.09.2022
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Summary:Enhanced oxidation with hydrogen radical pretreatment is described. In an example, a method of oxidizing a substrate includes positioning a substrate in a processing volume of a processing chamber, generating hydrogen radicals using a remote plasma source fluidly coupled to the processing chamber, exposing a surface of the substrate to the generated hydrogen radicals, and, subsequent to exposing the substrate to the generated hydrogen radicals, oxidizing the surface of the substrate to form an oxide layer on the surface of the substrate.
Bibliography:Application Number: US202217666188