MACHINE LEARNING BASED MODEL BUILDER AND ITS APPLICATIONS FOR PATTERN TRANSFERRING IN SEMICONDUCTOR MANUFACTURING
A system and a method of optimizing an optical proximity correction (OPC) model for a mask pattern of a photo mask is disclosed. A machine learning (ML) based model builder includes an OPC model, measurement data and a random term generator. Random terms are generated in a M-dimensional space by the...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
08.09.2022
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Subjects | |
Online Access | Get full text |
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Summary: | A system and a method of optimizing an optical proximity correction (OPC) model for a mask pattern of a photo mask is disclosed. A machine learning (ML) based model builder includes an OPC model, measurement data and a random term generator. Random terms are generated in a M-dimensional space by the random term generator. The ML based model builder classifies the random terms to clusters by applying a classifying rule. A representative subset of the random terms is determined among the classified clusters, and the representative subset is added to the OPC model. |
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Bibliography: | Application Number: US202117193625 |