DEFECT CLASSIFICATION AND SOURCE ANALYSIS FOR SEMICONDUCTOR EQUIPMENT
Defects on a substrate comprising electronic components can be classified with a computational defect analysis system that may be implemented in multiple stages. For example, a first stage classification engine may process metrology data to produce an initial classification of defects. A second stag...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
25.08.2022
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Subjects | |
Online Access | Get full text |
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Summary: | Defects on a substrate comprising electronic components can be classified with a computational defect analysis system that may be implemented in multiple stages. For example, a first stage classification engine may process metrology data to produce an initial classification of defects. A second stage classification engine may use the initial classification, along with manufacturing information and/or prior defect knowledge to output probabilities that the defects are caused by one or more potential sources. |
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Bibliography: | Application Number: US202217650666 |