DEFECT CLASSIFICATION AND SOURCE ANALYSIS FOR SEMICONDUCTOR EQUIPMENT

Defects on a substrate comprising electronic components can be classified with a computational defect analysis system that may be implemented in multiple stages. For example, a first stage classification engine may process metrology data to produce an initial classification of defects. A second stag...

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Bibliographic Details
Main Authors Danek, Michal, Gottscho, Richard A, Sawlani, Kapil, Hansen, Keith, Wells, Keith
Format Patent
LanguageEnglish
Published 25.08.2022
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Summary:Defects on a substrate comprising electronic components can be classified with a computational defect analysis system that may be implemented in multiple stages. For example, a first stage classification engine may process metrology data to produce an initial classification of defects. A second stage classification engine may use the initial classification, along with manufacturing information and/or prior defect knowledge to output probabilities that the defects are caused by one or more potential sources.
Bibliography:Application Number: US202217650666