APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST
A method and apparatus for applying an electric field and/or a magnetic field to a photoresist layer without air gap intervention during photolithography processes is provided herein. The method and apparatus include an electrode assembly and a base assembly. The electrode assembly includes a permea...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
18.08.2022
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Subjects | |
Online Access | Get full text |
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Summary: | A method and apparatus for applying an electric field and/or a magnetic field to a photoresist layer without air gap intervention during photolithography processes is provided herein. The method and apparatus include an electrode assembly and a base assembly. The electrode assembly includes a permeable electrode. The base assembly includes one or more process fluid channels disposed around a circumference of the substrate support surface and configured to fill a process volume with a process fluid. The electrode assembly is configured to apply an electric field to a substrate disposed within the process volume. |
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Bibliography: | Application Number: US202117176108 |