LITHOGRAPHIC APPARATUS AND METHOD

A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

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Bibliographic Details
Main Authors KNARREN, Bastiaan Andreas Wilhelmus Hubertus, JACOBS, Johannes Henricus Wilhelmus, TEN KATE, Nicolaas, KUNNEN, Johan Gertrudis Cornelis, NINO, Giovanni Francisco, REMIE, Marinus Jan, VOOGD, Robbert Jan, OTTENS, Joost Jeroen, LAURENT, Thibault Simon Mathieu
Format Patent
LanguageEnglish
Published 30.06.2022
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
Bibliography:Application Number: US202217698100