Surface Treatment Producing High Conductivity Vias With Simultaneous Polymer Adhesion

Treatment solutions and methods for treating a substrate including forming a first layer on a surface of the substrate, providing a process gas to the one or more plasma sources, the process gas includes a gas mixture of a reactive gas species and an inert gas species; forming a plasma under vacuum...

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Bibliographic Details
Main Authors Dick, Andrew R, Riemer, Douglas P
Format Patent
LanguageEnglish
Published 30.06.2022
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Summary:Treatment solutions and methods for treating a substrate including forming a first layer on a surface of the substrate, providing a process gas to the one or more plasma sources, the process gas includes a gas mixture of a reactive gas species and an inert gas species; forming a plasma under vacuum in the one or more plasma sources; and exposing the substrate to the plasma under vacuum to treat the first layer on the surface of the substrate.
Bibliography:Application Number: US202117560091