REFRACTORY OBJECT AND METHOD OF FORMING

A refractory object may include a zircon body that is intentionally doped with a dopant including an alkaline earth element and aluminum. The refractory object can have an improved creep deformation rate. In an embodiment, the refractory object can have a creep deformation rate of not greater than a...

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Bibliographic Details
Main Authors FOURCADE, Julien P, CETIN, Deniz, ROGERS, Darren, CITTI, Olivier
Format Patent
LanguageEnglish
Published 30.06.2022
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Summary:A refractory object may include a zircon body that is intentionally doped with a dopant including an alkaline earth element and aluminum. The refractory object can have an improved creep deformation rate. In an embodiment, the refractory object can have a creep deformation rate of not greater than about 1.8 E-5 h−1 at a temperature of 1350° C. and a stress of 2 MPa. In another embodiment, the zircon body may include an amorphous phase including an alkaline earth metal element.
Bibliography:Application Number: US202117645885