SEMICONDUCTOR MEMORY DEVICES AND METHODS FOR FABRICATING THE SAME
A semiconductor memory device in which performance and reliability are improved, and a method for fabricating the same are provided. The semiconductor memory device includes a conductive line extending in a first direction on a substrate, an interlayer insulation film that includes a cell trench ext...
Saved in:
Main Authors | , , , , , |
---|---|
Format | Patent |
Language | English |
Published |
23.06.2022
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A semiconductor memory device in which performance and reliability are improved, and a method for fabricating the same are provided. The semiconductor memory device includes a conductive line extending in a first direction on a substrate, an interlayer insulation film that includes a cell trench extending in a second direction intersecting the first direction, on the substrate, a first gate electrode and a second gate electrode that are spaced apart from each other in the first direction and each extend in the second direction, inside the cell trench, a channel layer that is inside the cell trench and is electrically connected to the conductive line, on the first gate electrode and the second gate electrode, and a gate insulation layer interposed between the first gate electrode and the channel layer, and between the second gate electrode and the channel layer. |
---|---|
Bibliography: | Application Number: US202117392488 |