METHOD OF MANUFACTURING SENSOR DEVICE AND SENSOR DEVICE

A sensor device includes a substrate having a substrate surface, a first IDT electrode positioned on the substrate surface, a second IDT electrode positioned on the substrate surface, a waveguide, and a protective film. The waveguide is positioned on the substrate surface and between the first IDT e...

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Bibliographic Details
Main Authors NAKAMURA, Shinnosuke, FUKUURA, Atsuomi, KATTA, Hiroshi
Format Patent
LanguageEnglish
Published 23.06.2022
Subjects
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Summary:A sensor device includes a substrate having a substrate surface, a first IDT electrode positioned on the substrate surface, a second IDT electrode positioned on the substrate surface, a waveguide, and a protective film. The waveguide is positioned on the substrate surface and between the first IDT electrode and the second IDT electrode. The waveguide includes a first immobilized layer positioned on the substrate surface and a second immobilized layer positioned on the first immobilized layer. The second immobilized layer is positioned inside an outer edge of the first immobilized layer as seen in a plan view.
Bibliography:Application Number: US202017606390