Composition Comprising Styrene Isoprene Block Copolymer and Ethylenically Unsaturated Monomer

Compositions are described comprising at least 20 wt. % of block copolymer comprising polyvinyl aromatic end blocks and a polyisoprene midblock and at least one ethylenically unsaturated monomer comprising one or more groups selected from (meth)acryl or vinyl ether. In one embodiment, the monomer ha...

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Bibliographic Details
Main Authors Sahni, Vasav, Chakraborty, Saswata, Clapper, Jason D, Mahoney, Wayne S, Johnson, Jacob P, Ross, Richard B
Format Patent
LanguageEnglish
Published 23.06.2022
Subjects
ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE
ADHESIVES
CHEMISTRY
DYES
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL
PAINTS
POLISHES
USE OF MATERIALS AS ADHESIVES
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Summary:Compositions are described comprising at least 20 wt. % of block copolymer comprising polyvinyl aromatic end blocks and a polyisoprene midblock and at least one ethylenically unsaturated monomer comprising one or more groups selected from (meth)acryl or vinyl ether. In one embodiment, the monomer has a Log P according to Moriguchi's method of at least 2.2. In another embodiment, the monomer is a multifunctional aromatic ethylenically unsaturated monomer. The composition is typically a (e.g. pressure sensitive) adhesive. Also described are methods of making an article, adhesive articles, and methods of bonding.
Bibliography:Application Number: US202017604530