OPTICAL METASURFACES, AND ASSOCIATED MANUFACTURING METHODS AND SYSTEMS

• Main Authors: Enoch, Stefan, Lumeau, Julien, Mikheeva, Elena, Abdeddaim, Redha, Voznyuk, Ivan, Antonakakis, Tryfon
• Format: Patent
• Language: English
• Published: 12.05.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; CINEMATOGRAPHY; ELECTROGRAPHY; GLASS; HOLOGRAPHY; JOINING GLASS TO GLASS OR OTHER MATERIALS; MATERIALS THEREFOR; METALLURGY; MINERAL OR SLAG WOOL; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS

A method for manufacturing an optical metasurface is configured to operate in a given working spectral band. The method comprises: obtaining a 2D array of patterns, each comprising one or more nanostructures forming dielectric elements that are resonant in said working spectral band, said nanostructures being formed in at least one photosensitive dielectric medium; exposing said 2D array to a writing electromagnetic wave having at least one wavelength in said photosensitivity spectral band, said writing wave having a spatial energy distribution in a plane of the 2D array that is a function of an intended phase profile, so that each pattern of the 2D array produces on an incident electromagnetic wave having a wavelength in the working spectral band, a phase variation corresponding to a refractive index variation experienced by said pattern during said exposure.