APPARATUS, SYSTEM, AND METHOD FOR GENERATING GAS FOR USE IN A PROCESS CHAMBER

• Main Author: Marquardt, David
• Format: Patent
• Language: English
• Published: 12.05.2022
• Subjects: CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; THEIR RELEVANT APPARATUS; TRANSPORTING

Embodiments described herein generally relate to apparatus having a canister with a sidewall, a top, and a bottom forming a canister volume. An inlet line and an outlet line is coupled to the top and is in fluid communication with the canister volume. A plate disposed within the canister volume forms a headspace volume below the plate. Each of the inlet line and the outlet line is in fluid communication with the headspace volume. The apparatus includes standoffs extending from a lower surface of the plate. The standoffs include a lower surface area substantially parallel with the plate.