SYSTEMS AND METHODS COMBINING MATCH NETWORKS AND FREQUENCY TUNING

A power system for a plasma processing system and associated methods are disclosed. The power system comprises a generator with a frequency-tuning subsystem, a match network coupled between the plasma processing chamber and the generator, and means for adjusting an impedance of the match network so...

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Bibliographic Details
Main Authors Choi, Myeong Yeol, Shaw, Denis
Format Patent
LanguageEnglish
Published 05.05.2022
Subjects
BASIC ELECTRIC ELEMENTS
BASIC ELECTRONIC CIRCUITRY
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS
RESONATORS
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Summary:A power system for a plasma processing system and associated methods are disclosed. The power system comprises a generator with a frequency-tuning subsystem, a match network coupled between the plasma processing chamber and the generator, and means for adjusting an impedance of the match network so the frequency-tuning subsystem adjusts a frequency of power applied by the generator to a target frequency while the match network presents a desired impedance to the generator in response to variations in an impedance of a plasma in a plasma processing chamber.
Bibliography:Application Number: US202117510566