DEBRIS CLEANING DEVICE AND ELECTROPLATING SYSTEM

A debris cleaning device includes: a process treatment tank for containing a liquid medicine and a substrate to be treated, wherein the bottom of the tank body of the process treatment tank is provided with a liquid medicine discharge port, and the side wall of the tank body of the process treatment...

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Bibliographic Details
Main Authors WANG, Chengfei, YUAN, Guangcai, QI, Qi, SUN, Shaodong, ZHANG, Guocai, DONG, Pengcheng, YAN, Junwei, DONG, Shihao
Format Patent
LanguageEnglish
Published 31.03.2022
Subjects
APPARATUS THEREFOR
CHEMISTRY
ELECTROFORMING
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
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Summary:A debris cleaning device includes: a process treatment tank for containing a liquid medicine and a substrate to be treated, wherein the bottom of the tank body of the process treatment tank is provided with a liquid medicine discharge port, and the side wall of the tank body of the process treatment tank is provided with a liquid medicine inlet port; and a self-circulation debris removal system, the self-circulation debris removal system comprising a circulation pipeline communicating between the liquid medicine discharge port and the liquid medicine inlet port, the circulation pipeline being provided with a control valve for controlling the on-off state of the circulation pipeline, a debris filtering and collecting device for filtering the debris in the circulation pipeline, and a power pump for providing circulation driving force for the liquid medicine in the circulation pipeline.
Bibliography:Application Number: US202117398980