High-Purity Quinoline Derivative and Method for Manufacturing Same

Provided is a compound represented by formula (IV) or a salt thereof, wherein the content of the compound represented by formula (I) is 350 ppm by mass or less.

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Bibliographic Details
Main Authors Akao, Atsushi, Nakamura, Taiju, Abe, Taichi, Miyashita, Yusuke, Ayata, Yusuke, Kuroda, Hirofumi
Format Patent
LanguageEnglish
Published 17.02.2022
Subjects
CHEMISTRY
HETEROCYCLIC COMPOUNDS
HUMAN NECESSITIES
HYGIENE
MEDICAL OR VETERINARY SCIENCE
METALLURGY
ORGANIC CHEMISTRY
SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS ORMEDICINAL PREPARATIONS
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Summary:Provided is a compound represented by formula (IV) or a salt thereof, wherein the content of the compound represented by formula (I) is 350 ppm by mass or less.
Bibliography:Application Number: US202117511773